VTC-600-2HD Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater

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US $999-35,999 / Set | 1 Set/Sets (Min. Order)
Supply Ability:
100 Set/Sets per Month
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Quick Details
Place of Origin:
Shandong, China (Mainland)
Brand Name:
Model Number:
After-sales Service Provided:
No overseas service provided
0086 535 2277555
Packaging & Delivery
Packaging Details
wooden case
Delivery Time
Shipped in 21 days after payment


Product Description





VTC-600-2HD is a magnetron sputtering system featuring dual target sources: 1) DC source for coating metallic material on one head and 2) RF source for coating non-metallic material on the other head. It is equipped with a film thickness tracker to enable the user to easily monitor the coating progress and also record the data. 
   This model is sophsticatedly designed for coating single or multiple film layers of a wide range of substrate materials (ferroelectric, condutive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE and etc). Its compactness and ease of operation make it an ideal coating system for use in R&D labs. 


Compact Structure
Input Power
  • 220VAC 50/60Hz, single phase

  • 2000W  (including pump)

Source Power

Two sputtering power sources are integrated into one control box  ( click picture below to see detailed specs )
  • DC source: 500W for coating metallic materials ( below left)

  • RF source: 600W with automatching for coating non-metallic materials ( Center)

  • Compact 300 RF source is available at extra cost ( Below right)


Magnetron Sputtering  Head

  • Two 2" Magnetron Sputtering  Heads with water cooling jackets are included ( click picture-left to see detailed specs )

    • One is connected to RF power supply for no-conductive materials

    • Another is connected to DC sputtering power source for coating metallic materials

  • Target size requirement: 2" diameter

    • 1/16" max. thickness for metallic targets

    • 1/4" max. thickness for no-conductive targets

    • One stainless steel and one Al2O3 ceramic targets are included for demo testing

  • Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally controlled recirculating water chiller is included for cooling both magnetron sputtering heads

  • Customized coater:  two RF head without DC sputering, 3 RF head are available upon request

Vacuum Chamber

  • Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel

  • Observation Window:  100 mm diameter

  • Hinged type cover on top with air spring sport makes target exchange easy


Sample Holder

  • Sample holder size: 140mm dia. for. 4" wafer max

  • Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating

  • The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C


Gas Flow Control

  • Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in

  • Flow rate:  200 ml/min max.

  • Flow rate is adjustable on the 6" touch screen control panel

Vacuum Pump Station

  • High speed turbo vacuum pump system (made in Germany) is directly installed on the vacuum chamber for max. vacuum level

  • Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed

  • Mobile pump station is included and the compact sputtering coater can be put on top of station

  • Max. vacuum level: 10^-6 torr with chamber baking

Thickness Monitor

  • One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å  

  • LED Display Unit outside chamber can:

    • Input material to be coated according to data base included

    • Display total thickness coated and coating speed

  • 5 pcs quartz sensors (consumable) are included 

  • Water cooling is required


Overall Dimensions

L1300mm× W660mm× H1200mm

Net Weight

160 kg


One years limited warranty with lifetime support

Operation Instruction

Application Note

  • In order to remove oxygen from the chamber,  suggest you use 5% Hytrogen + 95 % Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm

  • Please use > 5N purity Argon gas for plasma sputtering.  Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O dependedon  supplier.  Strongly suggest you use gas purification device listed below to purify gas before filling in:  ( click pic to order )

  • MTI supply single crystal substrate from A to Z ( click picture below-right to order )




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Company Information

Laizhou Weiyi experimental machine manufacturing Co.,Ltd. was established in 2001,covering 55 acres,which is one leading enterprise in the field of a professional R&D,manufacturing metallographic sample preparation erquipment. Was identified as Technology high-tech enterprises by Shandong Provincial Science , Shandong Academy of Sciences Research Building .


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Contact Information

Contact Person: Ichuka Lang

Skype: ichuka.lang

We Chat: yixiuka001    

Mobile: 86 186 6005 6893/133 2515 5105

126 Email: yixiuka001(@126.com)